(2-甲基烯丙氧基)三甲基硅烷 - Names and Identifiers
(2-甲基烯丙氧基)三甲基硅烷 - Physico-chemical Properties
Molecular Formula | C7H16OSi
|
Molar Mass | 144.29 |
Boling Point | 122°C |
Flash Point | 12°C (54°F) |
Specific Gravity | 0.7961 |
Sensitive | 7: reacts slowly with moisture/water |
Refractive Index | 1.4051 |
(2-甲基烯丙氧基)三甲基硅烷 - Introduction
Silane, trimethyl[(2-methyll-2-propenyl) oxy]-, chemical formula is C9H20Si, molecular weight is 156.33. It is a colorless to yellowish liquid with a peculiar odor. The following is a description of its nature, use, preparation and safety information:
Nature:
Silane, trimethyl[(2-methyl-2-propenyl)oxy]-is a hydrophobic organic silicon compound. It has a density of 0.786g/cm³ and a boiling point of 118-120 ° C (0.3 mmHg). It is soluble in organic solvents such as ethanol, ethers and alkanes, but insoluble in water.
Use:
It is often used as a reagent and intermediate in organic synthesis. Because it contains trimethylsilyl groups, it can be used for siliconization reactions in organic synthesis. In addition, it can also introduce silicone groups by reacting with other functional groups.
Method:
Silane, trimethyl[(2-methyll-2-propyl) oxy]-can be synthesized from the reaction of trimethylchlorosilane and 2-methylallyl alcohol. The specific synthesis method is as follows:
Trimethylchlorosilane is reacted with 2-methylallyl alcohol under alkaline conditions to obtain the target product. The reaction is usually carried out under an inert atmosphere to avoid unwanted reactions with moisture and oxygen in the air.
Safety Information:
Silane, trimethyl[(2-methyll-2-proxy) oxy]-May be irritating to the eyes, skin and respiratory system, protective measures should be taken. When in use, wear appropriate protective equipment, such as goggles and gloves, and ensure that the operation is carried out in a well-ventilated place. When handling this compound, avoid inhaling its vapor or mist. In case of accidental contact, rinse the affected area immediately with plenty of water and seek medical examination. Avoid contact with oxidants and strong acids during storage and handling.
Last Update:2024-04-10 22:29:15