Nitrogen trifluoride
Nitrogen trifluoride
CAS: 7783-54-2
Molecular Formula: F3N
Nitrogen trifluoride - Names and Identifiers
| Name | Nitrogen trifluoride |
| Synonyms | NF3 232-007-1 trifluoroamine Trifluoroamine Perfluoroammonia Stickstofftrifluorid Nitrogen trifluoride N,N,N-Trifluoroamine nitrogenfluoride(nf3) Stickstoff(III)-fluorid Nitrogen fluoride (NF3) |
| CAS | 7783-54-2 |
| EINECS | 232-007-1 |
| InChI | InChI=1/F3N/c1-4(2)3 |
Nitrogen trifluoride - Physico-chemical Properties
| Molecular Formula | F3N |
| Molar Mass | 71 |
| Density | (liq at bp) 1.885 |
| Melting Point | -207°C |
| Boling Point | -129°C |
| Water Solubility | insoluble |
| Vapor Presure | 110000mmHg at 25°C |
| Appearance | colorless gas |
| Odor | characteristic mouldy odor |
| Refractive Index | 1.187 |
| Physical and Chemical Properties | Nitrogen trifluoride chemical formula Nf3. Colorless, odorless, stable nature of liquefied gas, insoluble in water and alkali, chemically inert, but red heat with metal, non-metallic role, and oil and fat reaction, with intense action of hydrogen. high-purity nitrogen trifluoride has almost no odor. It is a thermodynamically stable oxidant, and can be decomposed into nitrogen difluoride and fluorine gas at about 350 ° C., so its reaction property is similar to that of fluorine. When nitrogen trifluoride is used as an oxidizing agent, it can be used as a source for supplying free radicals of nitrogen difluoride while the reaction occurs. The more common packaging has two kinds of 20KG/44L cylinder and 8~14 tons of ISO tube bundle groove. it is toxic and similar to fluoride and hydrofluoric acid. Acute toxicity: rats inhaled LC50176ppm(lh). The maximum allowable concentration in the air of the working environment is 10ppm (30mg/m3) in the United States. |
Nitrogen trifluoride - Risk and Safety
| Hazard Symbols | O - Oxidizing agent |
| Risk Codes | R8 - Contact with combustible material may cause fire R20 - Harmful by inhalation |
| Safety Description | S17 - Keep away from combustible material. S23 - Do not breathe vapour. S38 - In case of insufficient ventilation, wear suitable respiratory equipment. |
| UN IDs | 2451 |
| HS Code | 28129011 |
| Hazard Note | Strong oxidising agent |
| Hazard Class | 2.2 |
Nitrogen trifluoride - Reference Information
| NIST chemical information | information provided by: webbook.nist.gov (external link) |
| EPA chemical substance information | information provided by: ofmpeb.epa.gov (external link) |
| Background | the research on nitrogen trifluoride in China began in the Eighties of the last century, and the main unit is the 718 Research Institute of China Shipbuilding Industry Corporation. The development of nitrogen trifluoride industry is generally divided into three stages. The earliest stage is for the national defense industry, mainly for a small amount of production and self-use, the electronic industry with nitrogen trifluoride has come out; The third stage is in recent years, the rapid development of the electronic industry to promote. The production line of domestic nitrogen trifluoride has been put into operation, and its manufacturing level is equivalent to that of foreign developed countries. Due to the characteristics of the electronic industry gas is the market demand, the development speed is very fast, the technical difficulty is bigger, in the face of the rapid development of the International nitrogen trifluoride industry, compared with the domestic nitrogen trifluoride production enterprises are relatively weak. |
| Application | nitrogen trifluoride (NF3) is mainly used as a fluorine source for hydrogen fluoride-fluorinated gas high energy chemical lasers, an effective portion (about 25%) of the reaction energy between h2-O2 and F2 can be released with laser radiation, and the HF-OF laser is the most promising laser in chemical lasers. Nitrogen trifluoride is an excellent plasma etching gas in the microelectronics industry. For silicon and silicon nitride etching, using nitrogen trifluoride has higher etching rate and selectivity than carbon tetrafluoride and the mixed gas of carbon tetrafluoride and oxygen, moreover, it has no pollution to the surface, especially in the etching of integrated circuit materials with a thickness of less than 1.5um. Nitrogen trifluoride has very excellent etching rate and selectivity, and does not leave any residue on the surface of the etched object, it is also a very good cleaning agent. |
| Application | IC: because perfluorocarbons (PFCs) as gas cleaners in the semiconductor industry are hazardous to the environment, in recent years, there is a tendency to be gradually replaced by nitrogen trifluoride (NF3). The use of NF3 as a chemical vapor deposition (CVD) tank cleaning agent can reduce pollutant emissions by about 90% compared to perfluorocarbons, and can significantly increase the cleaning speed, thereby improving the cleaning equipment capacity by about 30%. LCD aspect: NF3 can also be used as an etchant, and is also used in the processing of liquid crystal display (LCD). solar cells: NF3 is also widely used in the solar cell manufacturing industry as an etching and cleaning gas. |
| production method | at present, there are two main routes for the industrial production of nitrogen trifluoride, one is the synthesis method: ammonium hydrogen fluoride was heated in a nickel-based reactor, and fluorine gas, nitrogen and ammonia were passed through a distributor into the reactor for direct fluorination. Two is the electrolysis method: At a certain temperature, the electrolysis of molten ammonium hydrogen fluoride, the electrolysis process of the anode to produce nitrogen trifluoride, the cathode to produce hydrogen. The production methods of nitrogen trifluoride manufacturers in China are the above two methods. In the presence of molten ammonium fluoride acid, the direct fluorination process of ammonia is adopted, and the reaction formula is as follows: the reaction product is subjected to a mist eliminator, a washing device, a molecular sieve adsorber, and vacuum distillation, various impurities can be removed separately, and finally NF 3 is collected by low temperature method. |
| category | hazardous gas |
| toxicity grade | poisoning |
| Acute toxicity | inhalation-rat LC50: 6700 PPM/ 1 hour; Inhalation-mouse LC50: 2000 PPM/4 h |
| flammability hazard characteristics | combustion support in case of hydrogen and grease; thermal decomposition of toxic fluoride and nitrogen oxide gases |
| storage and transportation characteristics | The warehouse is ventilated and dried at low temperature; Light loading and light unloading; And hydrogen, reducing agent, separate storage of Grease |
| fire extinguishing agent | water, foam mist |
| Occupational Standard | TWA 29 mg/m3; TEL 29 mg/m3 |
| DOT Classification | 2.2 (Nonflammable gas) |
| toxic substance data | information provided by: pubchem.ncbi.nlm.nih.gov (external link) |
| immediate life-and health-threatening concentrations | 1,000 ppm |
Last Update：2024-04-09 02:00:11
