Trifluoride chlorine
Chlorine trifluoride
CAS: 7990-91-2
Molecular Formula: ClF3
Trifluoride chlorine - Names and Identifiers
| Name | Chlorine trifluoride |
| Synonyms | CHLORINE TRIFLUORIDE Trifluoride chlorine Chlorine trifluoride |
| CAS | 7990-91-2 |
Trifluoride chlorine - Physico-chemical Properties
| Molecular Formula | ClF3 |
| Molar Mass | 92.45 |
| Physical and Chemical Properties | Physicochemical properties Chlorine trifluoride (ClF3) is a strong oxidant and fluorinating agent. It can react with most organic and inorganic materials and even plastics, and can make many materials burn without touching the fire source. These reactions are usually violent and in some cases even explode. It reacts with some metals to form chlorides and fluorides, reacts with phosphorus to form phosphorus trichloride and phosphorus pentafluoride, and reacts with sulfur to form sulfur dichloride and sulfur tetrafluoride. ClF3 also reacts violently with water and hydrolyzes to produce toxic substances, such as hydrogen fluoride. H2S explodes when mixed with ClF3 at room temperature. |
| Use | Use chlorine trifluoride (CIF3) is an important electronic special gas used for cleaning chemical vapor deposition chambers and their pipelines. Unlike other fluorine-containing gases (e. G., NF3, C2F6, and CF4), chlorine trifluoride is capable of reacting with the semiconductor material at room temperature, so that it can clean the cold-walled CVD chamber. Cleaning with chlorine trifluoride is a chemical etching process in which the heat in the chamber is sufficient to decompose and react with the semiconductor material, and there is no high-energy ion bombardment process like plasma, damage to the equipment can be minimized. Compared with the plasma cracking process, the chlorine trifluoride cleaning process is simple and efficient, and the cleaning effect is better. |
Trifluoride chlorine - Risk and Safety
| UN IDs | UN 1749 2.3 |
| Hazard Class | 2.3 |
Trifluoride chlorine - Overview
chlorine trifluoride (ClF3), due to its unique chemical structure, has a chemical activity that tends to be much milder than fluorine, and is more environmentally friendly than fluorocarbons. its GWP value is zero and is regarded as an ideal LPCVD cleaning gas. Japan's Kanto Chemical, Central Asahi Nitro and Iwagu industries have produced high-purity ClF3 products on a large scale as early as 2010. Because the chemical properties of ClF3 are too active, its safety is still controversial. China's ClF3 has not yet seen the industrialization report, China Shipbuilding Heavy Industry 718 had applied for a patent for chlorine trifluoride preparation technology in 2014.
Last Update：2024-04-10 22:29:15
Trifluoride chlorine - Reference Information
| overview | chlorine trifluoride (ClF3) has a unique chemical structure, but its chemical activity tends to be much milder than fluorine, and it is more environmentally friendly than fluorocarbons. its GWP value is zero and is regarded as an ideal LPCVD cleaning gas. Japan's Kanto Chemical, Central Asahi and Iwaya industries have produced high-purity ClF3 products on a large scale as early as 2010. Due to the chemical nature of ClF3 is too active, its safety is still controversial. China's ClF3 has not yet seen the industrialization report, China Shipbuilding Heavy Industry 718 had applied for a patent for chlorine trifluoride preparation technology in 2014. |
| Physical and chemical properties | Chlorine trifluoride (ClF3) is a strong oxidant and fluorinating agent. It can react with most organic and inorganic materials and even plastics, and can make many materials burn without touching the fire source. These reactions are usually violent and in some cases even explode. It reacts with some metals to form chloride and fluoride, reacts with phosphorus to form phosphorus trichloride and phosphorus pentafluoride, and reacts with sulfur to form sulfur dichloride and sulfur tetrafluoride. ClF3 also reacts violently with water and hydrolyzes to produce toxic substances, such as hydrogen fluoride. H2S explodes when mixed with ClF3 at room temperature. It can surpass the oxidizing ability of oxygen and cause corrosion to oxygen-containing materials, which are usually considered non-flammable. in an industrial accident, a 900 kg ClF3 leak burned itself through 30cm of concrete and 90cm of gravel. Any equipment that comes into contact with chlorine trifluoride must be carefully selected and cleaned, as any contamination can ignite the contact. chlorine trifluoride is usually packed in metal containers, which is almost the only way to temporarily control it. as long as it is pre-treated to form a metal fluoride protective layer, it can remain stable in some common metal containers. because of the active chemical nature of chlorine trifluoride, any equipment that comes into contact with it must be carefully cleaned and airtight. Unfortunately, it will immediately react with the inner wall of the container to produce fluoride that is no longer involved in the reaction, so that we can easily store it. |
| use | chlorine trifluoride (CIF3) is an important electronic special gas for cleaning chemical vapor deposition chambers and their pipelines. Unlike other fluorine-containing gases (such as NF3, C2F6 and CF4), chlorine trifluoride can react with semiconductor materials at room temperature, so it can clean the cold-walled CVD chamber. Cleaning with chlorine trifluoride is a chemical etching process. The heat in the chamber is sufficient to decompose and react with semiconductor materials. There is no high-energy ion bombardment process like plasma, and the damage to the equipment can be minimized. Compared with the plasma cracking process, chlorine trifluoride cleaning process is simple and efficient, and the cleaning effect is better. |
Last Update：2024-04-10 22:29:15
