TDMAH
Tetrakis(dimethylamido)hafnium(IV)
CAS: 19782-68-4
Molecular Formula: C8H24HfN4
TDMAH - Names and Identifiers
TDMAH - Physico-chemical Properties
| Molecular Formula | C8H24HfN4 |
| Molar Mass | 354.79 |
| Density | 1.098g/mLat 25°C |
| Melting Point | 26-29°C(lit.) |
| Boling Point | 85°C/0.1mm |
| Flash Point | 109°F |
| Appearance | crystal |
| Specific Gravity | 1.40 |
| Color | colorless to pale yellow |
| Storage Condition | Room Temprature |
| Sensitive | moisture sensitive, store cold |
TDMAH - Risk and Safety
| Risk Codes | R11 - Highly Flammable R14 - Reacts violently with water R34 - Causes burns |
| Safety Description | S6 - Keep under ... (there follows the name of an inert gas). S26 - In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. S36/37/39 - Wear suitable protective clothing, gloves and eye/face protection. S43 - In case of fire use ... (there follows the type of fire-fighting equipment to be used.) S45 - In case of accident or if you feel unwell, seek medical advice immediately (show the label whenever possible.) |
| UN IDs | UN 3396 4.3/PG 2 |
| WGK Germany | 3 |
TDMAH - Introduction
Tetrakis(dimethylamido)hafnium(IV) is an inorganic compound with the chemical formula Hf[N(CH3)2]4, also abbreviated as Hf(DMA)4. It is a colorless crystal that can exist stably at room temperature. The following is a description of its nature, use, preparation and safety information:
Nature:
1. Tetrakis(dimethylamido)hafnium(IV) is a colorless crystal with good solubility.
2. It is relatively stable at room temperature, but it will decompose at high temperature.
3. Tetrakis(dimethylamido)hafnium(IV) is an organic hafnium compound with certain thermal and chemical stability.
Use:
1. Tetrakis(dimethylamido)hafnium(IV) are mainly used in thin film preparation technologies such as chemical vapor deposition (CVD) and physical vapor deposition (PVD). It can be used as a precursor compound to prepare hafnium films with high quality and high film uniformity.
2. It can also be used as a catalyst in organic synthesis to participate in organic reactions and improve reaction efficiency and selectivity.
Preparation Method:
Tetrakis(dimethylamido) The preparation of hafnium(IV) is usually carried out by a basic complexation reaction of hafnium tetrachloride and dimethylamine in an organic solvent such as toluene or n-hexane.
Safety Information:
1. Tetrakis(dimethylamido) The powder form of hafnium(IV) is easy to burn and should be kept away from open flames and heat sources.
2. During operation and storage, avoid contact with air, moisture, water and strong oxidants.
3. contact Tetrakis(dimethylamido)hafnium(IV) should take appropriate protective measures, such as wearing gloves, goggles and laboratory coats.
4. in the course of use, please ensure good indoor ventilation, avoid inhalation of dust or vapor.
5. In case of swallowing or skin contact, seek medical attention immediately.
Nature:
1. Tetrakis(dimethylamido)hafnium(IV) is a colorless crystal with good solubility.
2. It is relatively stable at room temperature, but it will decompose at high temperature.
3. Tetrakis(dimethylamido)hafnium(IV) is an organic hafnium compound with certain thermal and chemical stability.
Use:
1. Tetrakis(dimethylamido)hafnium(IV) are mainly used in thin film preparation technologies such as chemical vapor deposition (CVD) and physical vapor deposition (PVD). It can be used as a precursor compound to prepare hafnium films with high quality and high film uniformity.
2. It can also be used as a catalyst in organic synthesis to participate in organic reactions and improve reaction efficiency and selectivity.
Preparation Method:
Tetrakis(dimethylamido) The preparation of hafnium(IV) is usually carried out by a basic complexation reaction of hafnium tetrachloride and dimethylamine in an organic solvent such as toluene or n-hexane.
Safety Information:
1. Tetrakis(dimethylamido) The powder form of hafnium(IV) is easy to burn and should be kept away from open flames and heat sources.
2. During operation and storage, avoid contact with air, moisture, water and strong oxidants.
3. contact Tetrakis(dimethylamido)hafnium(IV) should take appropriate protective measures, such as wearing gloves, goggles and laboratory coats.
4. in the course of use, please ensure good indoor ventilation, avoid inhalation of dust or vapor.
5. In case of swallowing or skin contact, seek medical attention immediately.
Last Update：2024-04-10 22:29:15
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CAS: 19782-68-4
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QQ: 3008007409
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CAS: 19782-68-4
Tel: 18301782025
Email: 3008007409@qq.com
Mobile: 18021002903
QQ: 3008007409
Wechat: 18301782025
Multiple SpecificationsSpot supply
Product Name: Tetrakis(dimethylamido)hafnium(IV) TDMAH Request for quotationCAS: 19782-68-4
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