tetrafluoro-german
GERMANIUM(IV) FLUORIDE
CAS: 7783-58-6
Molecular Formula: F4Ge
tetrafluoro-german - Names and Identifiers
tetrafluoro-german - Physico-chemical Properties
| Molecular Formula | F4Ge |
| Molar Mass | 148.63 |
| Density | 2.126g/mLat 0°C(lit.) |
| Melting Point | −36.5°C(lit.) |
| Boling Point | -36,5°C |
| Water Solubility | soluble H2O [CRC10] |
| Appearance | colorless gas |
| Specific Gravity | 2.126 |
| Merck | 13,4423 |
| Sensitive | 8: reacts rapidly with moisture, water, protic solvents |
| Physical and Chemical Properties | Germanium tetrafluoride (GeF4) is a kind of germanium fluoride, molecular weight of 148.63, colorless, spicy garlic odor gas, the air in water to produce a large number of white smoke. The nature of germanium tetrafluoride is stable in normal state, and hydrolysis occurs in water to generate GeO2 and H2GeF6. 3GeF4 2H2O → GeO2 2 H2GeF6. The reaction with anhydrous aluminum chloride produces germanium tetrachloride after halogen exchange. Completely dry germanium tetrafluoride gas, does not attack glass, but can attack Mercury and grease. Germanium tetrafluoride is used in the semiconductor industry for doping and ion implantation. Germanium tetrafluoride in combination with disilane gas can directly produce silicon germanium crystallites on glass substrates. |
tetrafluoro-german - Risk and Safety
| Risk Codes | 34 - Causes burns |
| Safety Description | S26 - In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. S36/37/39 - Wear suitable protective clothing, gloves and eye/face protection. S45 - In case of accident or if you feel unwell, seek medical advice immediately (show the label whenever possible.) |
| UN IDs | UN 3304 2.3 |
| WGK Germany | 3 |
| FLUKA BRAND F CODES | 21 |
| TSCA | Yes |
| Hazard Class | 2.3 |
tetrafluoro-german - Reference Information
| EPA chemical information | Information provided by: ofmpub.epa.gov (external link) |
| use | germanium tetrafluoride is used for doping and ion implantation in the semiconductor industry. Germanium tetrafluoride combined with disilane gas can directly produce silicon germanium crystallites on glass substrates. Germanium tetrafluoride can also be used as a synthetic agent in the chemical industry. Recently, germanium tetrafluoride has been used to directly manufacture silicon germanium crystallites on glass substrates in combination with disilane gas. Germanium and silicon nanocrystals can emit strong visible light, which has attracted much attention due to their potential application value in optoelectronic devices. |
| synthesis method | (1) heat germanium oxide with excess calcium fluoride and concentrated sulfuric acid. (2) Thermal decomposition of barium hexafluorogermanate. BaGeF6 → BaF2 GeF4 cools the generated gas to -112 ℃ with liquid carbon disulfide to remove volatile impurities. |
Last Update：2024-04-10 22:29:15
