Name | trifluoromethane |
Synonyms | R-23 FC-13 HFC-23 freon 23 FREON 23 fluoroform FLUOROFORM HALOCARBON 23 Halocarbon 23 Trifluoromethane trifluoromethane CARBON TRIFLUORIDE Carbon trifluoride Trifluoromethane(CHF3) trifluoromethane,refrigeratedliquid |
CAS | 75-46-7 |
EINECS | 200-872-4 |
InChIKey | XPDWGBQVDMORPB-UHFFFAOYSA-N |
Molecular Formula | CHF3 |
Molar Mass | 70.01 |
Density | 1.246 |
Melting Point | −160°C(lit.) |
Boling Point | −84°C(lit.) |
Water Solubility | slightly |
Vapor Presure | 635 psi ( 21 °C) |
Vapor Density | 2.43 (vs air) |
Merck | 13,4200 |
Stability | Stable. Incompatible with strong oxidizing agents. |
Refractive Index | 1.2150 |
Physical and Chemical Properties | Character: colorless and odorless gas. melting point -155 ℃ boiling point -82.05 ℃ |
Use | Used as a low temperature (-100 ℃) refrigerant, electronic industry plasma chemical etchant and fluorine compound raw material |
Hazard Symbols | F - Flammable |
Safety Description | 38 - In case of insufficient ventilation, wear suitable respiratory equipment. |
UN IDs | UN 1984 2.2 |
WGK Germany | 1 |
RTECS | PB6900000 |
TSCA | T |
Hazard Class | 2.2 |
colorless, odorless, non-combustible. Normal temperature is the liquefied gas. Liquid density 1.442g/mL(-80 C), the critical temperature of 25.7. The solubility was 0.10% by weight at 25 °c and 0.1 MPa. Slightly soluble in water, soluble in ethanol, ketone, ether, benzene, carbon tetrachloride, insoluble in ethylene glycol and glycerol. It is an inactive substance with chemical properties, which can react with nitrogen trioxide (N2 03) at 1 70 ℃ and with fluorinated nitrous acid (NOF) at 1 00 ℃. Slow photochemical chlorination can be performed, but photochemical bromination cannot occur. In case of high fever, the internal pressure of the container increases, and there is a risk of cracking and explosion. Contact with barium, calcium, strontium, and magnesium powders and oxides of these metals can react vigorously. Corrosion of magnesium and its alloys. Decomposition occurs when exposed to heat or contact with alkaline earth metals (such as barium, calcium, strontium, and magnesium) and alkali metals (such as lithium, sodium, potassium, rubidium, cesium, and strontium).
R22 (CHCIF2) was prepared by catalytic disproportionation reaction process. After distillation to remove impurities, more than 99. 99% of high purity CHF3 was obtained.
The electronic-grade fluorine analog is one of the plasma etching gases widely used in the microelectronics industry, especially for the etching of silicon dioxide film, which has the advantages of fast etching speed and good selectivity. In addition, fluoride is also used for low temperature mixed refrigerant, organic synthesis intermediates, infrared detector direct coolant, etc.
after contact can be Head Pain, Nausea and Vomit, and the role of anesthesia. Can be regarded as low toxic or non-toxic gas, high concentration of anesthesia, and combustible gas combustion decomposition to produce toxic fluoride. When poisoning is found, the victim should be removed from the contaminated area, keep warm, use artificial respiration if necessary, and immediately seek medical treatment. Non-combustible compressed gas. Store in a cool, ventilated warehouse. The bin temperature should not exceed 30 ℃. Keep away from fire and heat source. Protection from direct sunlight. Should be stored separately from flammable and combustible materials.